Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model

Ivan  Ohlídal; Jiří  Vohánka; Vilma  Buršíková; Jaroslav  Ženíšek; Petr  Vašina; Martin  Čermák; Daniel  Franta

doi:10.1116/1.5122014

ABSTRACT

This paper presents the results of the optical characterization of inhomogeneous thin films of polymer-like

{SiO}_{x} C_{y} H_{z}

and non-stoichiometric silicon nitride

{SiN}_{x}

. An efficient method combining variable angle spectroscopic ellipsometry and spectroscopic reflectometry applied at the near-normal incidence based on the multiple-beam interference model is utilized for this optical characterization. The multiple-beam interference model allows us to quickly evaluate the values of ellipsometric parameters and reflectance of the inhomogeneous thin films, which exhibit general profiles of their optical constants. The spectral dependencies of the optical constants of the inhomogeneous

{SiO}_{x} C_{y} H_{z}

and

{SiN}_{x}

thin films are determined using the Campi–Coriasso dispersion model. The profiles of the optical constants of these films can also be determined. Furthermore, the transition layers at the lower boundaries of the characterized films are also taken into account. Spectral dependencies of the optical constants of these transition layers are also determined using the Campi–Coriasso dispersion model.

ACKNOWLEDGMENTS

This work was supported by Project No. LO1411 (NPU I) funded by the Ministry of Education, Youth and Sports of the Czech Republic. Furthermore, this work was supported by the project 19-15240S of the Czech Science Foundation.

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Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model

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